Laser
microLED Laser Lift-off System-DPSS

SLO Series

SLO-300

QMC SLO Series는 DPSS Laser를 이용하여, Sapphire Wafer 또는 Substrate에서 micro LED Chip을 분리하는 공정의 장비입니다. 분리하고자 하는 Chip을 선택적으로 분리하는 Selective LLO 방식과 전체 Chip을 분리하는 Mass LLO 방식 중 하나를 선택할 수 있습니다.

OUTPUT


 

FEATURES
  • Enable Selective or Mass Laser Lift-off
  • Stable Top Hat Beam Implementation
  • Low Process Energy Density; Damage Free
  • Fast and Accurate Vision Alignment
  • Low Costs of Operation & Maintenance
  • Easy Maintenance
SPECIFICATION
Item Selective LLo Mass LLo
Laser Source DPSS Laser(Ultra Short Pulse) DPSS Laser(Ultra Short Pulse)
Spot Size 10um ~ 50um 50um
Beam Delivery System Homogenizer, Mask & Focusing Lens Homogenizer & Scanner
Source upto 6inch Wafer upto 6inch Wafer
Target ≤ 370mm x 470mm Substate ≤ 370mm x 470mm Substate
Stage X-Y-Z-T(Linear Motor Drive) X-Y-Z-T(Linear Motor Drive)
Chuck 380mm x 480mm(Porous Vacuum) 380mm x 480mm(Porous Vacuum)
Vision Inspection & Alignment
(2/3inch, Pixel Resolution 0.345um)
Inspection & Alignment
(2/3inch, Pixel Resolution 0.345um)
Cycle Time 317 sec/wafer @ 4inch wafer 403 sec/wafer @ 4inch wafer
System Dimension(W x D x H) 2,054mm x 2,200mm x 2,217mm,
Exclude Signal lamp
2,054mm x 2,200mm x 2,217mm,
Exclude Signal lamp